Tubular Low Pressure Deposition Furnace

Equipment Name

Tubular Low Pressure Deposition Furnace   Horizontal LPCVD

Equipment Model

LD-420A

Equipment Application

This equipment is mainly used for polysilicon deposition and in-situ doping on the surface of silicon wafers in the manufacture of crystalline silicon solar cells.

Equipment Application: mainly used for deposition of Poly-Si layer and in-situ doping in the production of c-si solar cells.

Technical Features

1. Low pressure chemical vapor deposition function.
Low pressure chemical vapor deposition.

2. Multiple water-cooling sealing mechanisms.
Multiple water-cooled tube sealing technology.

3. The double-layer structure of the reaction tube.
Double-layer quartz tube structure.

4. Independent adjustment of segmented air intake.
Independently regulated sectional air inlet.

5. Translating furnace door drive mechanism.
Translational furnace door driver mechanism.

6. High-speed and stable overall modular boat pushing mechanism.
High-speed integral module boat pushing mechanism.

7. Full digital control.
Digital control.

8. More temperature zone temperature control.
More temperature zone control.

9. Intelligent automatic control.
Intelligent automatic control.

10. Comprehensive security alarm protection functions such as anti-over-temperature, broken couple, and collision.

Alarm protection for over-heating, thermocouple-break and boat collision.

Device Parameters