Mono-crystalline Batch Texturing Equipment Equipment Model
SC-CSZ8000E-16F Equipment Application Equipment Application
Mainly for suede etching and cleaning of silicon wafers for monocrystalline silicon solar cells.
Used for texturing& cleaning of mono crystalline wafers.
Saw damage removal→Pre-cleaning→Mono-texturing→Post-cleaning or O 3 cleaning→ Pickling→Pre-dehydration→Drying (for reference)
Saw damage removal→Pre-cleaning→Mono-texturing→Post-cleaning/O 3 cleaning → Acid cleaning→Hot water drying→Drying (for reference only) Technical Features Features
1. Capacity: 400 pieces/batch, 8000 pieces/hour.
Throughput: 400pcs/batch, 8000pcs/h.
2. The circulation volume of the process tank is adjustable.
Process bath circulation volume adjustable.
3. The textured pyramid is uniform, and the etching depth is adjustable.
Uniform pyramids texture, etch depth adjustable.
4. Support the thinnest 120μm silicon wafer.
Wafer thickness handling capability up to 120μm.
5. Clean and dry area, self-cleaning and drying system.
With clean dry area and self-clean dry system.
6. No need to add H 2 O 2 .
H 2 O 2 free.
7. Quick fluid change, online fluid change.
Quick inline bath change.
8. Support MES, RFID and optional online weighing function.
Available with MES, RFID system, inline weight testing optional.