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Tubular Plasma Alumina Deposition Furnace
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HomeSolar Cell ManufacturingTubular Plasma Alumina Deposition Furnace Tubular Plasma Alumina Deposition Furnace
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Tubular Plasma Alumina Deposition Furnace

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Category: Tubular Plasma Alumina Deposition Furnace Tags: Solar cell manufacturing, Tubular Plasma Alumina Deposition Furnace
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Description

Tubular Plasma Alumina Deposition Furnace

Equipment Application:

The Tubular Plasma Alumina Deposition Furnace, utilizing a Horizontal PECVD (AlOx) process, serves a crucial role in solar cell manufacturing. It deposits an aluminum oxide passivation dielectric film on the back of silicon wafers, enhancing voltage and current characteristics. Subsequently, it deposits a protective silicon nitride film on the surface of the aluminum oxide layer, ensuring the durability and efficiency of solar cells.

Process Flow:

  • Preparation of graphite boat and silicon wafers
  • Nitrogen filling in the tube
  • Insertion of the boat
  • Vacuuming and pressure testing
  • Deposition of alumina composite film
  • Vacuuming and pressure testing
  • Pipeline cleaning and nitrogen filling
  • Withdrawal of the boat

Technical Features:

  1. Advanced Composite Film Technology: The furnace employs PERC technology to deposit complex layers of aluminum oxide, silicon oxynitride, and silicon nitride, enhancing the performance and durability of solar cells.
  2. Compatibility with PERC Processes: It is compatible with silicon nitride and silicon oxynitride PERC technology, ensuring flexibility and adaptability to varying manufacturing requirements.
  3. Enhanced Sealing Technology: Featuring double water-cooling sealing technology, the furnace ensures reliable sealing and efficient operation, minimizing energy consumption and optimizing performance.
  4. Innovative Heating Technology: Utilizing patented internal heating technology, the furnace achieves precise temperature control, enhancing the deposition process and ensuring uniform film formation.
  5. Efficient Boat Pushing Mechanism: The high-speed and stable modular boat pushing mechanism ensures efficient loading and unloading of wafers, contributing to streamlined workflow and enhanced productivity.
  6. Suspended Carrying Boat Technology: Employing suspended carrying boat technology, the furnace ensures that graphite boats make contact-free with the quartz tube, minimizing contamination and ensuring purity of deposited films.
  7. Integrated Software Solutions: Equipped with MES software boasting independent intellectual property rights and a self-developed central computer centralized control system, the furnace offers comprehensive control and monitoring capabilities, optimizing process management and efficiency.
  8. Rapid Coating Technology: The furnace incorporates fast coating technology, reducing processing time and enhancing throughput, contributing to improved productivity and cost efficiency.
  9. Comprehensive Safety Features: With alarm protection for over-heating, broken thermocouple, and boat collision, the furnace ensures operational safety and reliability, minimizing risks and ensuring smooth operation.

Benefits of Tubular Plasma Alumina Deposition Furnace

  1. Enhanced Solar Cell Performance: By depositing an aluminum oxide passivation dielectric film on the back of silicon wafers, the furnace enhances the voltage and current characteristics of solar cells, resulting in improved performance and efficiency.
  2. Durability and Protection: The deposition of a protective silicon nitride film on the surface of the aluminum oxide layer ensures the durability and longevity of solar cells, protecting them from environmental factors and wear.
  3. Process Flexibility: The furnace is compatible with various PERC processes, including silicon nitride and silicon oxynitride, offering flexibility and adaptability to meet diverse manufacturing requirements and specifications.
  4. Reliable Sealing Technology: Featuring double water cooling sealing technology, the furnace ensures reliable sealing, minimizing energy consumption and optimizing operational efficiency.
  5. Precise Temperature Control: Utilizing patented internal heating technology, the furnace achieves precise temperature control, ensuring uniform film formation and enhancing the quality and consistency of deposited films.
  6. Efficient Workflow: The high-speed and stable modular boat pushing mechanism facilitates efficient loading and unloading of wafers, streamlining workflow and enhancing productivity.
  7. Minimized Contamination: With suspended carrying boat technology, the furnace minimizes contamination risks by ensuring that graphite boats make contact-free with the quartz tube, maintaining the purity of deposited films.
  8. Comprehensive Control Capabilities: Equipped with MES software and a self-developed central computer control system, the furnace offers comprehensive control and monitoring capabilities, optimizing process management and efficiency.
  9. Improved Productivity: Incorporating fast coating technology, the furnace reduces processing time and enhances throughput, contributing to improved productivity and cost efficiency in solar cell manufacturing.
  10. Operational Safety: With alarm protection for over-heating, broken thermocouple, and boat collision, the furnace ensures operational safety and reliability, minimizing risks and ensuring smooth operation.
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