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HJT reactive plasma coating equipment
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HomeSolar Cell ManufacturingHJT reactive plasma coating equipment HJT reactive plasma coating equipment
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HJT reactive plasma coating equipment

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Category: HJT reactive plasma coating equipment Tags: HJT reactive plasma coating equipment, Solar cell manufacturing
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Description

Equipment Name

HJT Reactive Plasma Deposition (RPD)

Equipment Model

PAR5500A

Equipment Advantages

High dissociation rate ions, low bombardment energy coating, do not damage the surface of the substrate, maintain good interface characteristics, the carrier mobility of the film is very high, and the precision coating technology has been verified by long-term mass production.

High dissociation rate coating mechanism with almost no ion bombardment to maintain good interface characteristics where high carrier mobility can be reached in this reliable coating technology.

Equipment Application

Preparation of transparent conductive films.

Transparent Conductive Layer (TCO) coating.

Equipment  process

Using a low-energy, high-density electron beam sublimation target produces high dissociation rate ions that are plated on the surface of the substrate.

High free state target ions sublimated by low energy electron beam recombine on the substrate to form a high quality film.

Technical Features

1. The world’s largest heterojunction solar cell manufacturer is the only RPD equipment selected.
The world top one heterojunction solar cell manufacturer only chooses RPD equipment.

2. The indium dissociation rate is as high as 80% or more, and the high-quality transparent conductive film (TCO) is achieved.
Up to 80% indium dissociation rate, achieving high quality transparent conductive film.

3. The coating process is less than 30eV ion bombardment, does not damage the amorphous silicon film, and maintains good interface characteristics.
The coating process is less than 30eV ion bombardment, does not damage the amorphous silicon film, and maintains good interface characteristics.

4. High carrier mobility and low carrier concentration ensure excellent conductivity and high long-wavelength transmittance.
High carrier mobility and low carrier concentration ensure excellent conductivity and high long-wavelength transmittance.

5. The carrier mobility of the target material IWO is as high as 80cm 2 /V·s, and the carrier mobility of the new material ICO can be as high as 130cm 2 /V·s.
IWO carrier mobility up to 80cm 2 /Vs, where ICO carrier mobility can be as high as 130cm 2 /Vs

6. The long-term mass production verification of heterojunction manufacturers shows that the efficiency of cells prepared with RPD is 0.4% higher than that of other devices.
Long-term mass production verification of HJT cell manufacturers, the conversion efficiency of HJT solar cell manufactured by RPD is 0.4% more than made by other equipment.

7. According to the customer’s production line planning, linear RPD equipment and loop RPD equipment can be provided.
Linear type and loop type RPD equipment can be provided according to customer request.

Device Parameters

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